Technology For Chemical Cleaning Of Industrial Equipment

Presents new developments that have affected the commercial use of chemicals and devices to clean industrial equipment, with emphasis on the mechanisms of important cleaning processes and solvents and will give an overview of the science and technology of the formation and removal of fouling deposits in the industrial equipment environment.

More stringent quality standards and environmental/safety regulations as well as new process and chemical technology have changed industrial cleaning from a “wet and wipe application to a valued and demanding process operation. This book will help cleaning operatives, designers of equipment, metal finishers, industrial chemists and decontaminators understand the value and demands required within the industrial cleaning process and an environment of continuing change. * Covers all aspects of modern cleaning technologies, helping readers to understand basics of cleaning, equipment used, techniques and possible changes to come within the industry.* Includes environmental regulations and the basis for modern cleaning technologies, ensuring the reader is up to date on cleaning chemicals and their affects.* Covers testing for cleanliness, ensuring cleaning operatives, technicians and end users understand how to achieve the demands required within the industrial cleaning process and an environment of continuing change.

Lucid and practical presentation of the problems and solutions to industrial chemical cleaning. This essential reference examines the causes and composition of fouling, the various chemicals used for its control, hazards in cleaning, and an examination of cleaning methods for the most common industrial equipment. Includes a complete section on the chemical analysis of deposits and the procedures for determining the most effective cleaning solutions. A main reference tool for the industrial engineer who manages equipment cleaning operations and the consultant who is called in to do the job

Process equipment and piping in chemical and petrochemical plants and petroleum refineries have to be cleaned periodically as part of normal maintenance operations to remove fouling that interferes with process flow, heat transfer, or other operations. Cleaning is also necessary to allow safe personnel entry prior to equipment inspection, repairs, or modifications. Most cleaning operations are expensive and time-consuming and need to be planned, budgeted, and carried out in a timely fashion to ensure minimum interference with normal process or maintenance operations. Certain process equipment and piping may also have to be cleaned prior to being put into service for the first time. Such pre-commission cleaning removes rust, dirt, and other debris that formed or entered during fabrication, shipment, or erection, and that are likely to cause damage after start-up. process equipment and piping in chemical plants, petrochemical plants and petroleum refineries. Practical information and guidance is provided for plant engineers and operators who, from time to time, are charged with planning various cleaning operations that will be carried out either by in-house maintenance personnel or outside cleaning contractors. Sufficient information is given to enable the nonspecialist to either propose cleaning procedures or evaluate cleaning procedures proposed by others. The manual enumerates a multitude of factors that need to be considered before a cleaning operation is started, including timing, alternative methods, costs, manpower requirements, safety concerns, and waste disposal issues.

The word cleaning covers a wide range of activities from good housekeeping and janitorial duties to clinical process cleaning applications that form part of our everyday lives, most people are not aware of their existence, and yet without them, many of the services and products we take for granted would not be available. Most chapters include case studies of various cleaning problems together with the solutions offered. Emphasis is placed on the practical aspects of designing, manufacturing and operating cleaning equipment, this includes a detailed examination of traditional cleaning methods, and considers a number of lessor known techniques that have been developed over recent years together with a glimpse of the future trends in the industry In addition to the actual cleaning techniques, the book examines the effect, of increasing international health, safety, training, and environmental legislation together with regulations that control cleaning standards in the pharmaceuticals, cosmetics, food and drinks manufacturing industries. In this respect, the book is not intended to be a definitive reference book. Legislation and regulations are continually being upgraded, particularly those relating to European Directives. No apologies are given for the fact that the reader will be continually reminded of the need to obtain up to date copies of the various documents referred to, and to secure expert advice on those issues that are crucial in terms of health, safety and hazardous conditions. To assist the reader, useful information sources are listed in the reference section following each chapter. jkljk

Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.