Low And High Energy Ion Beams In Nanotechnology

Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implantation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.

Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implantation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.

A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

Part I of this book is dedicated to the proceedings of symposium I of the EMRS 1996 Spring Meeting. This Symposium on "New Trends in Ion Beam Processing of Materials" was held in Strasbourg (France) from the 4th to the 7th of June 1996. Ion- beam processing represents a particularly powerful tool to modify and synthesise materials such as semiconductors, metals, dielectrics, and ceramics, In particular, the continuous development of the semiconductor industry, with the consequent shrinkage of device dimensions, is placing severe constraints on ion-beam processing with demands for keV and meV energy beams, high doses, and unprecedented control over contamination, beam purity, and divergence. These requirements are posing new challenges to the ion-beam community, ranging from fundamental processes (such as defect generation, defect-defect interactions, phase transitions) to engineering (such as process control and novel equipment). The aim of this Symposium was to provide an international forum for the presentation and discussion of new work in the field of ion-beam processing. More than a hundred papers were presented by scientists from all over the world. particular emphasis was given to new trends in ion-beam processing of semiconductors and to the current challenges faced by microelectronic device manufacturing. The fields of transient- enhanced diffusion, gettering, optoelectronic applications, group IV hetero epitaxy, damage, annealing, and synthesis were treated in detail. The interaction between the semiconductor and other communities is important for the development of new concepts and presentations in the field of metals, insulators, and new techniques (such as plasma-immersion ion implantation) were extremely interesting. Part II is dedicated to the proceedings of symposium K. This symposium has focused on modifications of the structure and properties of materials which are induced by several kinds of irradiations: on the one hand high energy deposited in the electrons which relax their energy to the lattice (fs lasers, heavy ions in the GeV energy range, cluster beams in the MeV range) and on the other hand energy deposited directly on the lattice atoms (heavy ions and cluster beams in the keV energy range). The idea was to emphasize the link between the material modifications on a nanometric scale and the energy input on the fs time scale from both the experimental and theoretical point of view. To reach these goals our attention was focused on single event effects: single fs laser shots, single ion and cluster tracks (low and high energy).

This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.

The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

This book provides a comprehensive introduction to all aspects of low-energy ion–solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion–solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.

Over the last many year, ion beam implantation/irradiation has played an important role in fundamental studies and in development of new technologies as well. The present book includes the work exploring the use of ion beams in nanotechnology. Ion beam irradiation has become an unique tool for fabricating and engineering the nanostructures not only at the surface but also embedded in the matrix. This work includes the use of ion beams ranging from low energy (keV) to high energy (MeV)to fabricate and engineering the properties of metal nanopartices embedded in polymer matrix. This book, thus, provides the basic understanding of ion beam interaction with materials, chemical and physical modifications of materials, synthesis of nanopartices and tailoring of their properties in thin films.