Fundamentals Of Electrochemical Growth And Surface Limited Deposition

Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields." -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including: * Metal-solution interphase * Charge transfer across an interphase * Formation of an equilibrium electrode potential * Nucleation and growth of thin films * Kinetics and mechanisms of electrodeposition * Electroless deposition * In situ characterization of deposition processes * Structure and properties of deposits * Multilayered and composite thin films * Interdiffusion in thin film * Applications in the semiconductor industry and the field of medicine This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material. Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.

The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Fundamentals of Electrochemical Growth: From UPD to Microstructures ¿ Symposium in Memory of Prof. Evgeni Budevski¿, held during the 216th meeting of The Electrochemical Society, in Vienna, Austria from October 4 to 9, 2009.

Electrochemical processes and methods are basic to many important scientific disciplines, materials science and nanotechnology being only two keywords. For the first time in more than twenty years this volume presents a critical survey of the foundations, methodology and applications of electrochemical phase formation and growth processes. Written by a team of three internationally renowned authors, it is an invaluable source of information for all scientists concerned with electrocrystallization of metals or the in-situ characterization of electron-conducting surfaces. Not only the numerous illustrations (partly in colour) but also the vast number of references covering the literature up to and including 1995 make this volume indispensable for every laboratory working in electrochemical or materials science.

This volume of Modern Aspects of Electrochemistry has contributions from significant individuals in electrochemistry. This 7 chapter book discusses electrodeposition and the characterization of alloys and composite materials, the mechanistic aspects of lead electrodeposition, electrophoretic deposition of ceramic materials onto metal surfaces and the fundamentals of metal oxides for energy conversion and storage technologies. This volume also has a chapter devoted to the anodization of aluminum, electrochemical aspects of chemical and mechanical polishing, and surface treatments prior to metallization of semiconductors, ceramics, and polymers. This volume of Modern Aspects of Electrochemistry is ideal for scientists, researchers, engineers, and students interested in the latest findings in the field of electrodeposition and surface finishing.

This monograph is an attempt to present in a concise manner those aspects of the electrolytic growth of crystals considered to be of basic mechanistic significance. The accent has been put consistently on the understanding of the physical models of the processes discussed. Out of the extensive amount of information in this field, the authors have tried to abstract those systems which can be considered central, and which can, therefore, be related to the basic concepts connected with the electrodeposition of metals. In particular, stress has been laid upon consideration of atomic movements -of ions and molecules in solution, of adsorbed substances on the surface of metals, of steps on a growing crystal. Although the main stress is upon the physical picture, a number of derivations have been presented in detail. It is assumed that the reader is familiar to some degree with the concepts of electrodics; in particular, frequent reference is made to models of the electrical double layer at the metal solution interface and the transfer of charged species across it.

In the past few decades, research in the science of electrodeposition of metals has shown the important practical applications of electronic, magnetic, energy devices and biomedical materials. The aim of this new volume is to review the latest developments electrodeposition and present them to teachers, professionals, and students working in the field.