Science And Technology Of Dielectrics For Active And Passive Photonic Devices

The papers included in this issue of ECS Transactions were originally presented in the symposium ¿Science and Technology of Dielectrics for Active and Passive Devices¿, held during the PRiME 2008 joint international meeting of The Electrochemical Society and The Electrochemical Society of Japan, with the technical cosponsorship of the Japan Society of Applied Physics, the Korean Electrochemical Society, the Electrochemistry Division of the Royal Australian Chemical Institute, and the Chinese Society of Electrochemistry. This meeting was held in Honolulu, Hawaii, from October 12 to 17, 2008.

Silicon photonics is currently a very active and progressive area of research, as silicon optical circuits have emerged as the replacement technology for copper-based circuits in communication and broadband networks. The demand for ever improving communications and computing performance continues, and this in turn means that photonic circuits are finding ever increasing application areas. This text provides an important and timely overview of the ‘hot topics’ in the field, covering the various aspects of the technology that form the research area of silicon photonics. With contributions from some of the world’s leading researchers in silicon photonics, this book collates the latest advances in the technology. Silicon Photonics: the State of the Art opens with a highly informative foreword, and continues to feature: the integrated photonic circuit; silicon photonic waveguides; photonic bandgap waveguides; mechanisms for optical modulation in silicon; silicon based light sources; optical detection technologies for silicon photonics; passive silicon photonic devices; photonic and electronic integration approaches; applications in communications and sensors. Silicon Photonics: the State of the Art covers the essential elements of the entire field that is silicon photonics and is therefore an invaluable text for photonics engineers and professionals working in the fields of optical networks, optical communications, and semiconductor electronics. It is also an informative reference for graduate students studying for PhD in fibre optics, integrated optics, optical networking, microelectronics, or telecommunications.

Photonic crystals are anticipated to have impact on large-scale photonic integrated circuits by allowing the creation of compact and efficient devices such as waveguides, splitters, microcavity filters, light emitting diodes, and lasers. Previous experimental research has mainly focused on photonic crystals composed of a lattice of air holes etched into dielectric slabs. This thesis discusses the design, fabrication, and characterization of the "inverse" structure, a square lattice of dielectric-rods in air. Bandgap guiding of 1.5 lam light is experimentally demonstrated for a photonic-crystal waveguide created by introducing a line-defect of smaller-radii rods. To provide efficient optical coupling between input/output dielectric waveguides and the photonic-crystal waveguide, an adiabatic taper having two stages is employed. Furthermore, the thesis investigates novel photonic-crystal devices and fabrication schemes. An expose-develop-etch (EDE) method is utilized to fabricate rod-based photonic-crystal devices in III-V and SOI material systems. The thesis also presents an electrically-activated linear-waveguide photonic-crystal laser. A compact microcavity is created by introducing a defect inside a one-dimensional photonic crystal. Electrical-activation and edge-emission are achieved by patterning microcavity waveguides into p-i-n-doped epitaxial heterostructures. The compact photonic-crystal laser is anticipated to have impact on the integration of optical devices on the same chip.

This book focuses on the fundamentals, technologies and properties of ion irradiation of dielectric materials (e.g. glasses, crystals) with regard to various photonic applications. It introduces readers to diverse ion-beam techniques for the fabrication and modification of micron- or nanoscale photonic structures, including optical waveguides, photonic crystals, and nanoparticle (nano-spheres and nano-rods) systems, and presents state-of-the-art advances in this multi-disciplinary research field, demonstrating the unique capabilities of ion-beam technologies in optical dielectric materials processing. The book discusses in detail the properties of ion-beam processed waveguides, as well as the modification of dielectrics for photonic applications, such as electro-optic modulation, nonlinear frequency conversion, waveguide amplification and lasing. It also explores synthesis and the correlated optical effects of nanoparticles by ion beams, and features examples of successful micro- and nano-photonic devices. Given its breadth of coverage, the book will particularly appeal to readers interested in ion-beam technology, materials science, and integrated optics.

On-Chip Photonics: Principles, Technology and Applications reviews advances in integrated photonic devices and their demonstrated applications, including ultrafast high-power lasers on a chip, mid-infrared and overtone spectroscopies, all-optical processing on a chip, logic gates on a chip, and cryptography on a chip. The summaries in the book's chapters facilitate an understanding of the field and enable the application of optical waveguides in a variety of optical systems. The ultimate goal of this work is aimed at accelerating the transition of on-chip photonics from academia to the industry. Each chapter, where appropriate, provides an overview of the computational tools, fabrication methods, and suggestions for the realization of on-chip photonic devices. Introduces advanced concepts of passive and active on-chip photonic components Discusses emerging applications of on-chip photonics, quantum technologies, computing, and more Reviews materials, computational tools, and suggestions for the realization of on-chip photonic devices

This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted.

"The book Dielectric Materials and Applications focuses on the recent research advancements in the area of dielectrics that can be utilized in a variety of technology-oriented applications. The topics covered in this book include the investigations of materials having low dielectric constants for Cu interconnects, a two-layer metallic waveguide as a tool to determine the complex permittivity of liquids and/or clinical diagnostics, microwave dielectric materials for the miniaturization of portable electronic devices, microwave assisted heating of dielectric and composite materials, and the dielectric properties of certain 3D nanocomposites. The other areas of discussion encapsulate the modeling of supershaped dielectric lens antennas, the roles of dielectric mediums in metamaterials to realize photonic devices ranging from absorbers, sensors and communication systems. Some of the chapters are purely experimental, whereas some others are based on modeling and simulation. Reading this volume truly remains key to understanding novel applications of dielectric materials in different areas of technological interest"--