Production Of Highly Charged Ion Beams From Ecr Ion Sources

Electron Cyclotron Resonance (ECR) ion source development has progressed with multiple-frequency plasma heating, higher mirror magnetic fields and better technique to provide extra cold electrons. Such techniques greatly enhance the production of highly charged ions from ECR ion sources. So far at cw mode operation, up to 300 e[mu]A of O{sup 7+} and 1.15 emA of O{sup 6+}, more than 100 e[mu]A of intermediate heavy ions for charge states up to Ar{sup 13+}, Ca{sup 13+}, Fe{sup 13+}, Co{sup 14+} and Kr{sup 18+}, and tens of e[mu]A of heavy ions with charge states to Kr{sup 26+}, Xe{sup 28+}, Au{sup 35+}, Bi{sup 34+} and U{sup 34+} have been produced from ECR ion sources. At an intensity of at least 1 e[mu]A, the maximum charge state available for the heavy ions are Xe{sup 36+}, Au{sup 46+}, Bi{sup 47+} and U{sup 48+}. An order of magnitude enhancement for fully stripped argon ions (I ≥ 60 enA) also has been achieved. This article will review the ECR ion source progress and discuss key requirement for ECR ion sources to produce the highly charged ion beams.

The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

The book provides a comprehensive guide to the construction, operation, diagnostics, and applications of electron impact ion sources for the production of highly charged ions. Beside the treatment of elementary processes and ion storage in electron impact ion sources, characteristic diagnostic methods for these sources are described which are related to plasma diagnostics. Related to atomic and solid state physics the use of electron impact ion sources is discussed. Diese Monographie behandelt den Aufbau, den Betrieb, die Diagnostik und Anwendungen von Elektronenstoß-Ionenquellen zur Erzeugung hochgeladener Ionen. Neben der Behandlung von Basisprozessen in den Quellen erfolgt eine umfangreiche Beschreibung von Diagnostikmethoden mit Relevanz zur Ionenquellen- und Plasmadiagnostik.

Electron Cyclotron Resonance Ion Sources (ECRIS) using RF between 5 and 16 GHz have been developed into stable, reliable sources of highly charged ions produced from a wide range of elements. These devices are currently used as ion sources for cyclotrons, synchrotrons, and heavy-ion linacs for nuclear and relativistic heavy-ion physics. They also serve the atomic physics community as a source of low energy multiply-charged ions. In order to improve their performance both with respect to maximum charge state and beam intensity, ECRIS builders are now designing and constructing sources which will operate at frequencies up to 30 GHz. In this paper we review the present status of operating ECRIS, review recent experimental measurements on plasma parameters, and look at the technology and potential of sources operating at frequencies up to 30 GHz. 14 refs., 4 figs., 1 tab.

Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour

Heavy ion accelerators are a valuable resource for the nuclear science community to study atomic physics. One such heavy ion accelerator is the Coupled Cyclotron Facility (CCF) at the National Superconducting Cyclotron Laboratory (NSCL) which relies on Electron Cyclotron Resonance (ECR) ion sources to provide the primary beam to the target. ECR ion sources are essential for the efficient operation of research accelerators such as the CCF, providing high currents of highly charged ions. Highly charged ion beams increase the efficiency of the accelerators, but require longer confinement times and higher temperature plasmas in the ion sources than is necessary to produce singly charged beams. The need to use high temperature and low density plasmas creates challenges including those relating to plasma stability. ECR ion sources provide a good platform to accept metallic vapor ovens and sputtering probes allowing the CCF to accelerate up to 30 types of beams ranging from oxygen to uranium. Furthermore, ECR ion sources use no filaments or cathodes providing a high degree of reliability for the accelerator facility. As the intensity frontier demands ever rarer isotopes from accelerator facilities, the heavy ion beam intensity must increase [70], which creates new demands from the ion sources.The work presented within this dissertation set out to better understand the mechanism that confines highly charged ions in the ECR plasma. Specifically, it was explored if hot electrons (energy larger than 50 keV) contribute to ion confinement by generating an electrostatic well in the plasma potential [68]. Perturbative measurements of ECR ion sources are presented with the aim to explore ion confinement times: pulsed sputtering (Chapter 4) and amplitude modulation (Chapter 5). Chapter 3 explores the geometry of the sputtering probe with respect to the magnetic field which was crucial to produce reliable pulsed sputtering results on the ECR ion source. Axial pulsed sputtering, which could be conveniently implemented on fully superconducting sources, incorporated a bias disc effect that highly perturbed the plasma. Radial sputtering was emulated by placing a semi-shielded probe along the plasma chamber wall in between the electron loss surfaces.Ion confinement time was characterized through the decay time of the beam current, which is proportional to ion confinement time. Ion beam decay times were measured for different charge states of gold in an oxygen plasma in Chapter 4. Decay time always increased with increasing charge state. Decay time also increased with hot electron temperature for lower frequency operation (13 GHz), but reached an optimized value for higher frequency operation (18 GHz) due to plasma instabilities. Electrostatic confinement of ions appeared to be the most plausible mechanism to explain the observed decay time behaviors. A novel perturbative measurement technique was developed for ECR ion sources using Amplitude Modulation (AM) of microwave power. The AM measurement was originally motivated by whether or not 50~kHz modulation in microwave power (from the microwave source) would be observable in the beam current. A systematic study was organized on the University of Jyvaskyla Physics Department (JYFL) normal conducting ECR ion source in Jyvaskyla Finland. Chapter 5 presents the beam current response to AM on the 14 GHz ECR ion source for different weights of noble gases, magnetic fields, and vacuum pressures. The beam current amplitude generally decayed exponentially for frequencies higher than around 400 Hz with the modulation highly suppressed at 10 kHz.

The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

Berkeley, California, 26-30 September 2004