On Determination of the Degree of Dissociation of Hydrogen in Non-Equilibrium Plasmas by Means of Emission Spectroscopy

On Determination of the Degree of Dissociation of Hydrogen in Non-Equilibrium Plasmas by Means of Emission Spectroscopy
Author: Andrei V. Pipa
Publisher:
Total Pages: 0
Release: 2004
Genre:
ISBN: 9783832506452


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The results of the present work show an opportunity of pure spectroscopic detection of the degree of dissociation of hydrogen in low temperature plasmas and indicate an insufficient knowledge about elementary processes for plasma diagnostic.

Nonthermal Plasma Chemistry and Physics

Nonthermal Plasma Chemistry and Physics
Author: Jurgen Meichsner
Publisher: CRC Press
Total Pages: 554
Release: 2012-11-13
Genre: Science
ISBN: 1420059211


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In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant

Plasma Processing of Nanomaterials

Plasma Processing of Nanomaterials
Author: R. Mohan Sankaran
Publisher: CRC Press
Total Pages: 417
Release: 2017-12-19
Genre: Science
ISBN: 1439866775


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We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

Journal de physique

Journal de physique
Author:
Publisher:
Total Pages: 760
Release: 1998
Genre: Physics
ISBN:


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Physics Briefs

Physics Briefs
Author:
Publisher:
Total Pages: 1248
Release: 1994
Genre: Physics
ISBN:


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Characterization of Nonequilibrium Reacting Molecular Plasmas and Flames Using Coherent Anti-stokes Raman Spectroscopy

Characterization of Nonequilibrium Reacting Molecular Plasmas and Flames Using Coherent Anti-stokes Raman Spectroscopy
Author: Yi-chen Hung
Publisher:
Total Pages: 181
Release: 2018
Genre: Nonequilibrium plasmas
ISBN:


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CARS diagnostics has also been used to characterize a microwave discharge plasma in nitrogen, to determine the potential of a cw microwave discharge for energy-efficient plasmachemical dissociation of CO2. The measurement results indicate that rotational-translational temperature in a cw microwave discharge plasma in nitrogen is very high, up to T = 2000 K, such that it is extremely unlikely that significant vibrational nonequilibrium of N2 or CO2 can be sustained at these conditions. However, operating a pulsed microwave discharge at a very low duty cycle resulted in significant N2 vibrational nonequilibrium. In the afterglow, the plasma rapidly approaches near thermal equilibrium. The results suggest that energy efficient CO2 dissociation in pure CO2 or in CO2-N2 microwave discharges may be achieved either during pulsed operation, or at conditions when the flow residence time in the discharge is very short, as occurs in discharges sustained in supersonic flows.