Metalorganic Chemical Vapor Depositon Sic Of Indium Nitride And Indium Gallium Nitride Thin Films And Nanostructures For Electronic And Photovoltaic Applications

A VLS growth mechanism is proposed, however, a VS growth mechanism can be achieved at high N/In ratios. SEM and TEM analysis revealed a core-shell nanowire structure with a single crystal InN core and a poly-crystalline In2O3 shell. Nanowire growth occurs along the [0002] direction with diameters and lengths ranging from 100 to 300 nm and 10 to 40 microns, respectively for a 1 hr growth. H-MOCVD growth of InN nano- and microrods occurred on different substrates and the nanorod structure was studied by TEM. The polarity of the substrate directly affected the nanorod tip shape and prismatic stacking faults are suggested as the cause for the flower-like growth habit. Variation of growth parameters, such as temperature, N/In ratio, and Cl/In ratio proved to be ineffective at changing the aspect ratio of the nanorods. Increased growth duration produces microrod size dimensions regardless of the chosen growth conditions.

METAL OXIDE NANOCOMPOSITE THIN FILMS FOR OPTOELECTRONIC DEVICE APPLICATIONS The book provides insight into the fundamental aspects, latest research, synthesis route development, preparation, and future applications of metal oxide nanocomposite thin films. The fabrication of thin film-based materials is important to the future production of safe, efficient, and affordable energy as the devices convert sunlight into electricity. Thin film devices allow excellent interface engineering for high-performance printable solar cells as their structures are highly reliable and stand-alone systems can provide the required megawatts. They have been used as power sources in solar home systems, remote buildings, water pumping, megawatt-scale power plants, satellites, communications, and space vehicles. Metal Oxide Nanocomposite Thin Films for Optoelectronic Device Applications covers the basics of advanced nanometal oxide-based materials, their synthesis, characterization, and applications, and all the updated information on optoelectronics. Topics discussed include the implications of metal oxide thin films, which are critical for device fabrications. It provides updated information on the economic aspect and toxicity, with great focus paid to display applications, and covers some core areas of nanotechnology, which are particularly concerned with optoelectronics and the available technologies. The book concludes with insights into the role of nanotechnology and the physics behind photovoltaics. Audience The book will be an important volume for electronics and electrical engineers, nanotechnologists, materials scientists, inorganic chemists in academic research, and those in industries, exploring the applications of nanoparticles in semiconductors, power electronics, and more.

Selected peer-reviewed extended articles based on abstracts presented at the 2nd International Conference on Semiconductor Materials and Technology (ICoSeMT 2021) Aggregated Book

Special topic volume with invited peer-reviewed papers only

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

This book provides a highly practical treatment of Glancing Angle Deposition (GLAD), a thin film fabrication technology optimized to produce precise nanostructures from a wide range of materials. GLAD provides an elegant method for fabricating arrays of nanoscale helices, chevrons, columns, and other porous thin film architectures using physical vapour deposition processes such as sputtering or evaporation. The book gathers existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: Development and description of GLAD techniques for nanostructuring thin films Properties and characterization of nanohelices, nanoposts, and other porous films Design and engineering of optical GLAD films including fabrication and testing, and chiral films Post-deposition processing and integration to optimize film behaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensive relevant literature, and a survey of GLAD's wide range of material properties and diverse applications.

III-Nitride nanostructures have been an active area of research.