Diffusion Fundamentals

This book describes the central aspects of diffusion in solids, and goes on to provide easy access to important information about diffusion in metals, alloys, semiconductors, ion-conducting materials, glasses and nanomaterials. Coverage includes diffusion-controlled phenomena including ionic conduction, grain-boundary and dislocation pipe diffusion. This book will benefit graduate students in such disciplines as solid-state physics, physical metallurgy, materials science, and geophysics, as well as scientists in academic and industrial research laboratories.

Handbook of Solid State Diffusion, Volume 1: Diffusion Fundamentals and Techniques covers the basic fundamentals, techniques, applications, and latest developments in the area of solid-state diffusion, offering a pedagogical understanding for students, academicians, and development engineers. Both experimental techniques and computational methods find equal importance in the first of this two-volume set. Volume 1 covers the fundamentals and techniques of solid-state diffusion, beginning with a comprehensive discussion of defects, then different analyzing methods, and finally concluding with an exploration of the different types of modeling techniques. Presents a handbook with a short mathematical background and detailed examples of concrete applications of the sophisticated methods of analysis Enables readers to learn the basic concepts of experimental approaches and the computational methods involved in solid-state diffusion Covers bulk, thin film, and nanomaterials Introduces the problems and analysis in important materials systems in various applications Collates contributions from academic and industrial problems from leading scientists involved in developing key concepts across the globe

This book is the first comprehensive treatise of one of the key physical processes occurring in various materials at elevated temperatures. The book provides essential background information for materials scientists, metallurgists, solid state physicists and semiconductor technologists carrying out research or development in this and related areas. The first and second editions of the book were published by the University of Stuttgart in 1988 and 1989. In the present third edition the book has been updated and essentially enlarged to cover all recent developments in the area of grain and interphase boundary diffusion. The reader will find more than 100 new text pages, 60 new figures and 100 new references. This unique book is strongly recommended as a textbook for students as well as a reference book for physicists, chemists, metallurgists and engineers.

"Molecular Sieves - Science and Technology" covers, in a comprehensive manner, the science and technology of zeolites and all related microporous and mesoporous materials. The contributions are grouped together topically in such a way that each volume deals with a specific sub-field. Volume 7 treats fundamentals and analyses of adsorption and diffusion in zeolites including single-file diffusion. Various methods of measuring adsorption and diffusion are described and discussed.

The energetics and mechanisms of diffusion control the kinetics of such diverse phenomena as the fabrication of semiconductors and superconductors, the tempering of steel, geological metamorphism, the precipitation hardening of nonferrous alloys and corrosion of metals and alloys. This work explains the fundamentals of diffusion in the solid state at a level suitable for upper-level undergraduate and beginning graduate students in materials science, metallurgy, mineralogy, and solid state physics and chemistry. A knowledge of physical chemistry such as is generally provided by a one-year undergraduate course is a prerequisite, though no detailed knowledge of solid state physics or crystallography is required.

Atoms and molecules in all states of matter are subject to continuous irregular movement. This process, referred to as diffusion, is among the most general and basic phenomena in nature and determines the performance of many technological processes. This book provides an introduction to the fascinating world of diffusion in microporous solids. Jointly written by three well-known researchers in this field, it presents a coherent treatise, rather than a compilation of separate review articles, covering the theoretical fundamentals, molecular modeling, experimental observation and technical applications. Based on the book Diffusion in Zeolites and other Microporous Solids, originally published in 1992, it illustrates the remarkable speed with which this field has developed since that time. Specific topics include: new families of nanoporous materials, micro-imaging and single-particle tracking, direct monitoring of transient profiles by interference microscopy, single-file diffusion and new approaches to molecular modeling.

Atoms and molecules in all states of matter are subject to continuous irregular movement. This process, referred to as diffusion, is among the most general and basic phenomena in nature and determines the performance of many technological processes. This book provides an introduction to the fascinating world of diffusion in microporous solids. Jointly written by three well-known researchers in this field, it presents a coherent treatise, rather than a compilation of separate review articles, covering the theoretical fundamentals, molecular modeling, experimental observation and technical applications. Based on the book Diffusion in Zeolites and other Microporous Solids, originally published in 1992, it illustrates the remarkable speed with which this field has developed since that time. Specific topics include: new families of nanoporous materials, micro-imaging and single-particle tracking, direct monitoring of transient profiles by interference microscopy, single-file diffusion and new approaches to molecular modeling.

This special issue of Defect and Diffusion Forum contains selected refereed papers which were presented at the 7th International Conference on Diffusion in Solids and Liquids (DSL-2011) held on the 26 to 30th June 2011 at the Hilton Vilamoura, Algarve, Portugal. The goal of the conference was to provide a unique opportunity to exchange information, to present the latest results and review burning issues in contemporary diffusion research. Young scientists were especially encouraged to attend the conference and to establish international links with established scientists. Volume is indexed by Thomson Reuters CPCI-S (WoS)