Development of Silicon Germanium-based Quantum Dots for Nanoelectronic Device Applications
Author | : Sandro John Di Giacomo |
Publisher | : |
Total Pages | : 352 |
Release | : 2005 |
Genre | : Lithography, Electron beam |
ISBN | : |
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Abstract: As CMOS dimensions decrease each year, the International Technology Roadmap for Semiconductors (ITRS) encourages development of "emerging research devices" to eventually replace CMOS. SiGe-based quantum dots, the focus of this study, are attractive because they can be integrated with existing Si -based devices and fabricated using existing processes. This process exploits self-limiting effects in Si nanopillar oxidation and Ge segregation during SiGe oxidation to fabricate uniformly sized Ge quantum dots suitable for room temperature operation. In this study, four fabrication processes were investigated: electron-beam lithography (EBL), inductively-coupled plasma (ICP) etching, thermal oxidation, and transmission electron microscopy (TEM). The samples consisted of rows of closely spaced Si nanopillars, with diameters of 25-100 nm and heights of 80-600 nm.