Molecular Electronics: Volume 582

Molecular Electronics: Volume 582
Author: Sokrates T. Pantelides
Publisher:
Total Pages: 144
Release: 2001-01-19
Genre: Technology & Engineering
ISBN:


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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

The Granular State: Volume 627

The Granular State: Volume 627
Author: Surajit Sen
Publisher:
Total Pages: 338
Release: 2001-04-09
Genre: Technology & Engineering
ISBN:


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These 38 papers from the April 2000 symposium study granular structure, granular flows, nonlinear waves in granular media, vibrated and rotated granular media, and stress distributions. Topics include jamming in liquids and granular materials, nuclear magnetic resonance studies of granular flows, the blueprint of a concept for a nozzle- free inkjet printer, mixing and segregation processes in a Turbula blender, persistence of granular structure during die compaction of ceramic powders, and humidity-induced cohesion effects in granular media. c. Book News Inc.

Wide-Bandgap Electronic Devices: Volume 622

Wide-Bandgap Electronic Devices: Volume 622
Author: R. J. Shul
Publisher:
Total Pages: 578
Release: 2001-04-09
Genre: Technology & Engineering
ISBN:


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Interest in wide-bandgap semiconductors for high-power/high-temperature electronics remains prominent. For such applications, SiC is by far the most mature semiconductor material. GaN and diamond, however, have also become prime candidates. While diamond has several advantages over the other two materials, producing large single crystals, as well as the inability to achieve n-type doping, have limited device fabrication. For GaN, recent advances in crystal growth and processing capabilities, as well as excellent transport properties, have yielded a great deal of device development, yet thermal conduction remains an issue. SiC has excellent thermal conductivity, high-breakdown voltages, and well-developed substrates and processing techniques. This book deals with a wide range of technical activity in the area of wide-bandgap high-power/high-temperature electronic devices and covers topics including the fabrication and performance of GaN-based and SiC-based devices, as well as issues related to growth, characterization, and processing of wide-bandgap materials. Several summaries of the current status of the field are provided.

Magnetic Materials, Structures and Processing for Information Storage: Volume 614

Magnetic Materials, Structures and Processing for Information Storage: Volume 614
Author: Materials Research Society. Fall Meeting
Publisher:
Total Pages: 200
Release: 2001-03-29
Genre: Computers
ISBN:


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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Solid Freeform and Additive Fabrication - 2000: Volume 625

Solid Freeform and Additive Fabrication - 2000: Volume 625
Author: Stephen C. Danforth
Publisher: Mrs Proceedings
Total Pages: 240
Release: 2000-10-02
Genre: Computers
ISBN:


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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Si Front End Processing - Physics and Technology II of Dopant-Defect Interactions II: Volume 610

Si Front End Processing - Physics and Technology II of Dopant-Defect Interactions II: Volume 610
Author: Aditya Agarwal
Publisher:
Total Pages: 448
Release: 2001-04-09
Genre: Technology & Engineering
ISBN:


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This proceedings of the April 2000 symposium deals with formation of electrical junctions in the front-end processing of devices for the approaching end-of-the-roadmap. The 60 papers address 2D dopant characterization, ion implantation and shallow junction technology, group III diffusion and activation, carbon diffusion and activation, group V diffusion and activation, vacancy-type defects, regrown amorphous layers, and structure and properties of point and extended defects. Topics include ultra-shallow junction formation and gate activation in deep-submicron CMOS, low energy implantation of boron with decaborane ions, modeling ramp rate effects on shallow junction formation, clustering equilibrium and deactivation kinetics in As doped silicon, and atomistic modeling of complex silicon processing scenarios. c. Book News Inc.

Chemical-mechanical Polishing

Chemical-mechanical Polishing
Author:
Publisher:
Total Pages: 184
Release: 2000
Genre: Electrolytic polishing
ISBN:


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