A Very Low Pressure Chemical Vapor Deposition Process For Blanket And Selective Titanium Silicide Films
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Author | : Vida Ilderem |
Publisher | : |
Total Pages | : 458 |
Release | : 1988 |
Genre | : |
ISBN | : |
Download A Very Low Pressure Chemical Vapor Deposition Process for Blanket and Selective Titanium Silicide Films Book in PDF, Epub and Kindle
Author | : Jaegab Lee |
Publisher | : |
Total Pages | : 270 |
Release | : 1991 |
Genre | : |
ISBN | : |
Download A Low Pressure Chemical Vapor Deposition Process for Titanium Disilicide Films with and Without Plasma Enhancement Book in PDF, Epub and Kindle
Author | : |
Publisher | : |
Total Pages | : 440 |
Release | : 1990 |
Genre | : Materials |
ISBN | : |
Download Research in Materials Book in PDF, Epub and Kindle
Author | : Vida Ilderem |
Publisher | : |
Total Pages | : 202 |
Release | : 1985 |
Genre | : |
ISBN | : |
Download Low Pressure Chemical Vapor Deposition of Titanium Silicide Book in PDF, Epub and Kindle
Author | : Massachusetts Institute of Technology |
Publisher | : |
Total Pages | : 448 |
Release | : 1990 |
Genre | : Materials |
ISBN | : |
Download Research in Materials Book in PDF, Epub and Kindle
Author | : |
Publisher | : |
Total Pages | : 934 |
Release | : 1994 |
Genre | : Physics |
ISBN | : |
Download Physics Briefs Book in PDF, Epub and Kindle
Author | : Xiaowei Ren |
Publisher | : |
Total Pages | : 244 |
Release | : 1995 |
Genre | : |
ISBN | : |
Download Selective Rapid Thermal Chemical Vapor Deposition of Titanium Silicide Book in PDF, Epub and Kindle
Author | : Hugh O. Pierson |
Publisher | : William Andrew |
Total Pages | : 458 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 1437744885 |
Download Handbook of Chemical Vapor Deposition Book in PDF, Epub and Kindle
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Author | : C. Y. Chang |
Publisher | : McGraw-Hill Science, Engineering & Mathematics |
Total Pages | : 756 |
Release | : 1996 |
Genre | : Technology & Engineering |
ISBN | : |
Download ULSI Technology Book in PDF, Epub and Kindle
"This text follows the tradition of Sze's highly successful pioneering text on VLSI technology and is updated with the latest advances in the field of microelectronic chip fabrication. Since computer chips are foundations of modern electronics, these topics are essential for the next generation of USLI technologies, allowing more transistors to be packaged on a single chip. Contributing to each chapter are industry experts, specializing in topics such as epitaxy with low temperature process, rapid thermal processes, low damage plasma reactive ion etching, fine line litography, cleaning technology, clean room technology, packing and reliability."--
Author | : J. M. Blocher |
Publisher | : |
Total Pages | : 844 |
Release | : 1981 |
Genre | : Chemical vapor deposition |
ISBN | : |
Download Proceedings of the Eighth International Conference on Chemical Vapor Deposition Book in PDF, Epub and Kindle